Nanosphere Lithography for Nitride Semiconductors
نویسندگان
چکیده
منابع مشابه
On-chip surface-enhanced Raman spectroscopy using nanosphere-lithography patterned antennas on silicon nitride waveguides.
A hybrid integration of nanoplasmonic antennas with silicon nitride waveguides enables miniaturized chips for surface-enhanced Raman spectroscopy at visible and near-infrared wavelengths. This integration can result in high-throughput SERS assays on low sampling volumes. However, current fabrication methods are complex and rely on electron-beam lithography, thereby obstructing the full use of a...
متن کاملFabrication of nanopillars by nanosphere lithography
A low cost nanosphere lithography method for patterning and generation of semiconductor nanostructures provides a potential alternative to the conventional top-down fabrication techniques. Forests of silicon pillars of sub-500 nm diameter and with an aspect ratio up to 10 were fabricated using a combination of the nanosphere lithography and deep reactive ion etching techniques. The nanosphere e...
متن کاملOrdered arrays of silicon nanowires produced by nanosphere lithography and molecular beam epitaxy.
Because of their importance in fundamental research and possible applications in nanotechnology and nanoelectronics, semiconductor nanowires have attracted much interest. In addition to the growth itself, the control of the size and location is an essential problem. Here we show the growth of ordered arrays of vertically aligned silicon nanowires by molecular beam epitaxy using prepatterned arr...
متن کاملNanosphere lithography: A materials general fabrication process for periodic particle array surfaces
In this article nanosphere lithography ~NSL! is demonstrated to be a materials general fabrication process for the production of periodic particle array ~PPA! surfaces having nanometer scale features. A variety of PPA surfaces have been prepared using identical single-layer ~SL! and double-layer ~DL! NSL masks made by self-assembly of polymer nanospheres with diameter, D5264 nm, and varying bot...
متن کاملNanosphere photolithography for sub-100nm features
Microfabrication is commonly achieved via interactions of light and a photoresist (an optically sensitive material). In this process, the light is shaped into the desired pattern by a mask and projected onto the photoresist. The entire photoresist sample is then submerged within a developer, which dissolves the exposed photoresist and leaves the unexposed photoresist intact. Mask patterns can t...
متن کامل